Advances in Electronics and Electron Physics

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Front Cover 2
Advances in Electronics and Electron Physics, Volume 69 5
Copyright Page 6
Contents 7
Contributors 9
Preface 11
Chapter 1. Voltage Measurement in the Scanning Electron Microscope 15
- I. Introduction 15
- II. Historical Background 16
- III. Introduction to the SEM 17
- IV. Qualitative Voltage Contrast 20
- V. Voltage Contrast Linearization for Potential Measurements 24
- VI. Auger Electron Voltage Measurement Schemes 38
- VII. Estimate for Minimum Measurable Voltage 39
- VIII. Observation of Fast Voltage Waveforms and Dynamic Voltage Distribution 45

Front Cover 2
Advances in Electronics and Electron Physics, Volume 69 5
Copyright Page 6
Contents 7
Contributors 9
Preface 11
Chapter 1. Voltage Measurement in the Scanning Electron Microscope 15
- I. Introduction 15
- II. Historical Background 16
- III. Introduction to the SEM 17
- IV. Qualitative Voltage Contrast 20
- V. Voltage Contrast Linearization for Potential Measurements 24
- VI. Auger Electron Voltage Measurement Schemes 38
- VII. Estimate for Minimum Measurable Voltage 39
- VIII. Observation of Fast Voltage Waveforms and Dynamic Voltage Distribution 45
- IX. Electron-Beam Pulsing in the SEM 47
- X. Stroboscopic and Sampling-Mode Operation of the SEM 58
- XI. Voltage Contrast with Synchronous and Asynchronous Pulsed Beams 61
- XII. Conclusions 64
- References 65
Chapter 2. New Experiments and Theoretical Development of the Quantum Modulation of Electrons (Schwarz–Hora Effect) 69
- I. Introduction 69
- II. Review of Experiments 71
- III. The Quantum Property of Modulation Derived from a Correspondence Principle for Electromagnetic Interaction 86
- IV. Coherence Effects 91
- V. Peierls Dispersion in the Varshalovich–Dyakonov Correction to Explain the Relativistic Long Beating Wavelength 100
- VI. A Comprehensive Scattering Model for Quantum Modulation 103
- VII. Re-emission of Radiation from a Quantum-Modulated Beam 107
- VIII. Concluding Remarks 122
- References 124
Chapter 3. Device Developments for Optical Information Processing 129
- I. Introduction 129
- II. Light Sources 131
- III. Light Control Devices 137
- IV. Photodetectors 175
- V. Summary 182
- References 183
Chapter 4. Monte Carlo Methods and Microlithography Simulation for Electron and X-Ray Beams 189
- I. Introduction 190
- II. Monte Carlo Modeling of Electron Scattering 191
- III. Monte Carlo Modeling of the Photo- and Auger Electron Production in X-Ray Lithography 211
- IV. Resist Modeling 217
- V. Applications to Pattern Analyses in Electron-Beam Lithography 222
- VI. Applications to X-Ray Lithography 257
- VII. Applications to Registration Mark Detection in Electron-Beam Lithography and Mask Inspection Technology 262
- References 269
Chapter 5. Invariance in Pattern Recognition 275
- I. Introduction 276
- II. Computational Vision 278
- III. Review of Basic Concepts 282
- IV. Geometrical Invariance 289
- V. Statistical Invariance 304
- VI. Restoration 312
- VII. Structural Methods 317
- VIII. Conclusions 332
- References 334
Index 337

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